ASML has become Europes most valuable company by dominating one of the most critical technologies in modern chipmaking: ...

ASML's near-total control of EUV lithography makes it an indispensable supplier to advanced logic and memory manufacturing.

Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...

Laser-plasma interactions represent a cornerstone of high-energy-density physics, where intense laser pulses interact with solid or gaseous targets to generate plasmas. This process underpins the ...

Legendary Intel CTO and CEO Pat Gelsinger is now serving as executive chairman at xLight, a startup that develops a free electron laser (FEL) technology as a light source for extreme ultraviolet (EUV) ...

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV machines that are used by TSMC, Intel and other chip manufacturers of advanced ...

US startup aims to develop free-electron lasers directly emitting EUV light, in place of today’s laser-driven plasma systems. xLight, a US startup aiming to commercialize particle accelerator driven ...

Add Yahoo as a preferred source to see more of our stories on Google. A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by ...

Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). Our EUV diffractive imaging experiment setup. A photo of the high-harmonic generation (HHG) ...