Lithographers have always faced tradeoffs between speed and flexibility. Steppers are very good at printing hundreds or thousands of identical features onto hundreds or thousands of wafers. They are ...

San Jose, Calif.– Maskless lithography, a next-generation derivative of direct-write electron-beam technology, is generating some excitement among chip producers. Foundry giant Taiwan Semiconductor ...

In a breakthrough set to revolutionize the semiconductor industry, engineers have developed the world's first-of-its-kind deep-ultraviolet (UVC) microLED display array for lithography machines. This ...

A team led by Prof. Sun Haiding from the University of Science and Technology of China (USTC) developed a vertically integrated micro-scale light-emitting diode (micro-LED) array which was then ...

Researchers from the Hong Kong University of Science and Technology, Southern University of Science and Technology, and the Suzhou Institute of Nanotechnology developed an aluminum gallium nitride ...

Maskless lithography encompasses a suite of methods that eliminate the need for physical photomasks by using programmable optical elements or direct‐write beams to define patterns on photoresist ...

SUNNYVALE, Calif. &#151 ASML Holding NV and Micronic Laser Systems AB have quietly scrapped plans to develop a standalone system for maskless lithography applications. ASML and Micronic are still ...

The research team is under the supervision of Prof. KWOK Hoi-Sing (center), Founding Director of the State Key Laboratory of Advanced Displays and Optoelectronics Technologies at HKUST. Core member Dr ...

(Nanowerk News) In a breakthrough set to revolutionize the semiconductor industry, the School of Engineering of the Hong Kong University of Science and Technology (HKUST) has developed the world’s ...

A team led by Prof. SUN Haiding from the University of Science and Technology of China (USTC) developed a vertically integrated micro-scale light-emitting diode (micro-LED) array，which was then ...