Si2 announced that Cadence has donated extensions to the OpenAccess community which enable physical design tools to represent Multi-Patterned Technology (MPT). Conventional photolithography cannot ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...

Researchers, equipment vendors, and manufacturers alike are watching with growing concern as we creep every closer to the end of 193 nm optical lithography. The problem is not that there are no ...

With the ongoing US-China tensions, Huawei exemplified its ability to make 7nm chips without EUV equipment, and chip guru Burn Lin believes it's not surprising for Huawei to achieve the milestone, but ...

Lithography scanner light source provider demonstrates capability for the future generation of larger wafers. OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source ...

To avoid the need for multi-patterning in 1.4nm and 1nm processes, High-NA EUV will be needed, says imec. “For A14 and A10 logic nodes, requirements for the most critical metal layers (i.e., M0 and M2 ...

Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...

When we talk about computing these days, we tend to talk about software and the engineers who write it. But we wouldn’t be anywhere without the hardware and the physical sciences that have enabled it ...

Semiconductor Engineering sat down to discuss photomask technologies with Naoya Hayashi, research fellow at Dai Nippon Printing (DNP); Banqiu Wu, principal member of the technical staff and chief ...

Introduction of the breakthrough "s" series features, extending DUV light source performance, enhancing availability and reducing operating costs. SPIE Advanced Lithography 2012 - OYAMA, ...