A new technical paper titled “Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review” was published by researchers at KU Leuven and imec.
Canopus AI has introduced 'Metrospection,' an AI-driven approach designed to improve workflows in wafer and mask metrology.
Figure 1. Scanning electron microscope (SEM) image of a computing chip equipped with a highly reliable selector-less 32×32 memristor crossbar array (left). Hardware system developed for real-time ...
SEM image of "multielement ink" halide perovskite crystal (IMAGE) DOE/Lawrence Berkeley National Laboratory Caption Scanning electron microscope image of six-element single crystals. The crystals are ...
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